1.

Conference Proceedings
Conference Proceedings
1. Enhancing the development rate model in optical lithography simulation of ultrathick resist films for applications such as MEMS and LIGA
Arthur,G.G. ; Martin,B.
Pub. info.: Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK.  pp.209-220,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4404
2.

Conference Proceedings
Conference Proceedings
2. Progress of the MMT adaptive optics program
Wildi,F.P. ; Brusa,G. ; Riccardi,A. ; Allen,R.G. ; Lloyd-Hart,M. ; Miller,D. ; Martin,B. ; Biasi,R. ; Gallieni,D.
Pub. info.: Adaptive optics systems and technology II : 30 July-1 August 2001, San Diego, USA.  pp.11-18,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4494
3.

Conference Proceedings
Conference Proceedings
3. Influence of lens aberrations on high-resolution imaging on low-reflectivity substrates
Martin,B. ; Arthur,C.G. ; Wallace,C.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.372-383,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
4.

Conference Proceedings
Conference Proceedings
4. Definition and control of contact holes in a CMP process
Wallace,C. ; Martin,B. ; Arthur,G.G.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.594-602,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
5.

Conference Proceedings
Conference Proceedings
5. Comparison of recent development models in optical lithography simulation
Arthur,G.G. ; Wallace,C. ; Martin,B.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.538-549,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
6.

Conference Proceedings
Conference Proceedings
6. Enhancing the development-rate model for optimum simulation capability in the subhalf-micron regime
Arthur,G.G. ; Martin,B. ; Mack,C.A.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.189-200,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
7.

Conference Proceedings
Conference Proceedings
7. Effect of reticle manufacturing quality on full chip optical proximity correction
Martin,B. ; Arthur,G.G.
Pub. info.: Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland.  pp.197-201,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3741
8.

Conference Proceedings
Conference Proceedings
8. Analysis technique for quantifying the effectiveness of optical-proximity-corrected photomasks and its application to defect printability
Arthur,G.C. ; Martin,B.
Pub. info.: Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland.  pp.202-212,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3741
9.

Conference Proceedings
Conference Proceedings
9. Effect of photoresist contrast on intrafield critical dimensions in sub-half-micron optical lithography
Wallace,C. ; Martin,B. ; Arthur,G.G.
Pub. info.: Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland.  pp.213-221,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3741
10.

Conference Proceedings
Conference Proceedings
10. Pitch-dependent intrafield dimensional offsets in advanced lithography
Wallace,C. ; Martin,B. ; Arthur,G.G.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.656-662,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
11.

Conference Proceedings
Conference Proceedings
11. Next Generation Space Telescope:a monolithic mirror candidate
Angel,R. ; Martin,B. ; Sandler,D.G. ; Wolf,N. ; Bely,P.Y. ; Benvenuti,P. ; Fosbury,R. ; Laurance,R.J. ; Crocker,J.H. ; Giacconi,R.
Pub. info.: Space telescopes and instruments IV : 6-7 August 1996, Denver, Colorado.  pp.354-356,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2807
12.

Conference Proceedings
Conference Proceedings
12. Design of the BATC testbed for wavefront error sensing and correction
Atcheson,P.D. ; Quigley,P.C. ; Towell,T. ; Martin,B.
Pub. info.: Advanced telescope design, fabrication, and control : 19 and 21 July 1999, Denver, Colorado.  pp.121-129,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3785
13.

Conference Proceedings
Conference Proceedings
13. BATC testbed segmented mirror design,assembly,and operation
Martin,B. ; Atcheson,P.D. ; Quigley,P.C.
Pub. info.: Advanced telescope design, fabrication, and control : 19 and 21 July 1999, Denver, Colorado.  pp.168-177,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3785
14.

Conference Proceedings
Conference Proceedings
14. Metric for process optimization on substrates with transparent stacks in optical lithography
Martin,B. ; Arthur,G.G.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.641-647,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
15.

Conference Proceedings
Conference Proceedings
15. Optimum design for optical proximity correction in submicron bipolar technology using critical shape error analysis
Arthur,G.G. ; Martin,B. ; Wallace,C.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.631-640,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
16.

Conference Proceedings
Conference Proceedings
16. Stepper lens field critical dimension uniformity and optical proximity correction
Martin,B.
Pub. info.: Process and equipment control in microelectronic manufacturing II : 30-31 May, 2001, Edinburgh, UK.  pp.100-104,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4405
17.

Conference Proceedings
Conference Proceedings
17. Some measurements on the effects of developer depletion
Martin,B. ; Tighe,T.
Pub. info.: Process and equipment control in microelectronic manufacturing II : 30-31 May, 2001, Edinburgh, UK.  pp.142-147,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4405
18.

Conference Proceedings
Conference Proceedings
18. Application of optical proximity correction in manufacturing and its effect on process control
Wallace,C. ; Duncan,C. ; Martin,B.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.663-670,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
19.

Technical Paper
Technical Paper
19. Improved Diesel Particulate Filter Regeneration Performance Using Fuel Soluble Additives
Vincent,M.W. ; Richards,P.J. ; Dementhon,J.-B. ; Martin,B.
Pub. info.: Gasoline direct injection and diesel aftertreatment.  pp.101-112,  1999.  Society of Automotive Engineering, Inc.
Title of ser.: SAE special publication
Ser. no.: SP-1476
20.

Technical Paper
Technical Paper
20. Numerical Study of Zinc Coated Car Body Laser Welding
Loredo,A. ; Martin,B. ; Andrzejewski,H. ; Pilloz,M. ; Grevey,D. ; Habert,P. ; Goby,L. ; Joly,M.
Pub. info.: Manufacturing.  pp.59-64,  2001.  Warrendale, Pa..  Society of Automotive Engineering, Inc.
Title of ser.: SAE publication
Ser. no.: P-369
21.

Technical Paper
Technical Paper
21. Novel Additive for Particulate Trap Regeneration
Dementhon,J.-B. ; Martin,B. ; Richards,P. ; Rush,M. ; Williams,D. ; Bergonzini,L. ; Morelli,P.
Pub. info.: Emission processes and control technologies in Diesel engines.  pp.87-98,  1995.  Society of Automotive Engineering, Inc.
Title of ser.: SAE special publication
Ser. no.: SP-1119
22.

Conference Proceedings
Conference Proceedings
22. Minimizing optical proximity effect at subhalf-micron resolution by the variation of stepper lens operating conditions at i-line,248-nm,and 193-nm wavelengths
Arthur,G.G. ; Martin,B.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.64-75,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725
23.

Conference Proceedings
Conference Proceedings
23. Assessment of resist-specific isofocal behavior in optical lithography at half-micron resolution
Arthur,G.G. ; Martin,B.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.85-93,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725
24.

Conference Proceedings
Conference Proceedings
24. Subhalf-micron polysilicon gate control from 365-to 193-nm exposure
Martin,B. ; Arthur,G.G.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.94-104,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725
25.

Conference Proceedings
Conference Proceedings
25. Effect of reticle bias on isofocal process performance at sub-half-micron resolution
Martin,B. ; Arthur,G.G.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XI.  pp.496-506,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3050
26.

Conference Proceedings
Conference Proceedings
26. Optimizaion of dielectric antireflective coatings on a transparent substrate in sub-half-micron CMOS technology
Arthur,G.G. ; Martin,B. ; Wallace,C.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.644-652,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
27.

Conference Proceedings
Conference Proceedings
27. Enhancing the rules for optical proximity correction to improve process latitude
Martin,B. ; Arthur,G.G.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.631-636,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
28.

Conference Proceedings
Conference Proceedings
28. Swing curve phase and amplitude effects in optical lithography
Martin,B. ; Tighe,T. ; Arthur,G.G.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.616-622,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
29.

Conference Proceedings
Conference Proceedings
29. Comparison of contact hole definition using laser and shaped e-beam mask writers and its influence on wafer level pattern fidelity
Martin,B. ; Lloyd,R. ; Davies,G. ; Arthur,G.G.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.530-536,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
30.

Conference Proceedings
Conference Proceedings
30. Manufacture of photomasks for critical layers of sub-half-micron CMOS technology
Martin,B. ; Waring,T.R.
Pub. info.: 17th Annual BACUS Symposium on Photomask Technology and Management.  pp.340-349,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3236
31.

Conference Proceedings
Conference Proceedings
31. Full-chip optical proximity correction using lithography simulation
Arthur,G.G. ; Martin,B. ; Wallace,C. ; Rosenbusch,A. ; Fryer,H.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.574-584,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546