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18 results

Conference Proceedings

1. Enhancing the development rate model in optical lithography simulation of ultrathick resist films for applications such as MEMS and LIGA

Arthur,G.G. ; Martin,B.

Pub. info.:	Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK. pp.209-220, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4404

Conference Proceedings

2. Definition and control of contact holes in a CMP process

Wallace,C. ; Martin,B. ; Arthur,G.G.

Pub. info.:	Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California. pp.594-602, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3332

Conference Proceedings

3. Comparison of recent development models in optical lithography simulation

Arthur,G.G. ; Wallace,C. ; Martin,B.

Pub. info.:	Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California. pp.538-549, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3332

Conference Proceedings

4. Enhancing the development-rate model for optimum simulation capability in the subhalf-micron regime

Arthur,G.G. ; Martin,B. ; Mack,C.A.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.189-200, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

5. Effect of reticle manufacturing quality on full chip optical proximity correction

Martin,B. ; Arthur,G.G.

Pub. info.:	Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland. pp.197-201, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3741

Conference Proceedings

6. Effect of photoresist contrast on intrafield critical dimensions in sub-half-micron optical lithography

Wallace,C. ; Martin,B. ; Arthur,G.G.

Pub. info.:	Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland. pp.213-221, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3741

Conference Proceedings

7. Pitch-dependent intrafield dimensional offsets in advanced lithography

Wallace,C. ; Martin,B. ; Arthur,G.G.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.656-662, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

Conference Proceedings

8. Metric for process optimization on substrates with transparent stacks in optical lithography

Martin,B. ; Arthur,G.G.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.641-647, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

Conference Proceedings

9. Optimum design for optical proximity correction in submicron bipolar technology using critical shape error analysis

Arthur,G.G. ; Martin,B. ; Wallace,C.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.631-640, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

10.

Conference Proceedings

10. Minimizing optical proximity effect at subhalf-micron resolution by the variation of stepper lens operating conditions at i-line,248-nm,and 193-nm wavelengths

Arthur,G.G. ; Martin,B.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography X. pp.64-75, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2725

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