Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK. pp.111-122, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK. pp.144-152, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.401-416, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Optical microlithography XI : 25-27 February 1998, Santa Clara, California. pp.176-196, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part1 pp.261-275, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.189-200, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California. pp.76-88, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.215-227, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland. pp.148-160, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland. pp.73-89, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.850-860, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.355-362, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part1 pp.183-192, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.245-254, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.706-711, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.658-664, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California. Part1 pp.283-297, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK. pp.380-395, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part1 pp.2-20, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part1 pp.395-412, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 2 pp.1218-1231, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing II :23-24 September 1998 Santa Clara, California. pp.164-178, 1998. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Microlithographic Techniques in Integrated Circuit Fabrication II. pp.169-177, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Microlithographic Techniques in Integrated Circuit Fabrication II. pp.83-92, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
17th Annual BACUS Symposium on Photomask Technology and Management. pp.424-429, 1998. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
17th Annual BACUS Symposium on Photomask Technology and Management. pp.413-423, 1998. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Metrology, Inspection, and Process Control for Microlithography X. pp.49-63, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Photomask and Next-Generation Lithography Mask Technology VII. pp.172-179, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Microelectronic Manufacturing Yield, Reliability, and Failure Analysis. pp.84-94, 1995. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Lithographic and Micromachining Techniques for Optical Component Fabrication. pp.59-72, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Photomask and Next-Generation Lithography Mask Technology VIII. pp.194-203, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Metrology, Inspection, and Process Control for Microlithography XV. pp.200-207, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Metrology, Inspection, and Process Control for Microlithography XV. pp.169-176, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Metrology, Inspection, and Process Control for Microlithography XV. pp.377-384, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
18th Annual BACUS Symposium on Photomask Technology and Management. pp.32-44, 1998. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
17th Annual BACUS Symposium on Photomask Technology and Management. pp.216-227, 1998. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
18th Annual BACUS Symposium on Photomask Technology and Management. pp.606-616, 1998. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering