1.

Conference Proceedings
Conference Proceedings
1. Toward a universal resist dissolution model for lithography simulation
Robertson,S.A. ; Mack,C.A. ; Maslow,M.J.
Pub. info.: Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK.  pp.111-122,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4404
2.

Conference Proceedings
Conference Proceedings
2. Measurement and analysis of reticle and wafer-level contributions to total CD variation
Preil,M.E. ; Mack,C.A.
Pub. info.: Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK.  pp.144-152,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4404
3.

Conference Proceedings
Conference Proceedings
3. Improved simulation of photoresists using new development models
Dammel,R.R. ; Sagan,J.P. ; Kokinda,E. ; Eilbeck,N. ; Mack,C.A. ; Arthur,G.G. ; Henderson,C.L. ; Scheer,S.A. ; Rathsack,B.M. ; Willson,C.G.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.401-416,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
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Conference Proceedings
Conference Proceedings
4. Lithography simulation employing rigorous solutions to Maxwell's equations
Gordon,R.L. ; Mack,C.A.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.176-196,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
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Conference Proceedings
Conference Proceedings
5. Impact of mask errors on full chip error budgets
Schellenberg,F.M. ; Boksha,V.V. ; Cobb,N.B. ; Lai,J.C. ; Chen,C.H. ; Mack,C.A.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.261-275,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
6.

Conference Proceedings
Conference Proceedings
6. Enhancing the development-rate model for optimum simulation capability in the subhalf-micron regime
Arthur,G.G. ; Martin,B. ; Mack,C.A.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.189-200,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
7.

Conference Proceedings
Conference Proceedings
7. Three-dimensional electron-beam lithography simulation
Mack,C.A.
Pub. info.: Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California.  pp.76-88,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3048
8.

Conference Proceedings
Conference Proceedings
8. Analytic approach to understanding the impact of mask errors on optical lithography
Mack,C.A.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.215-227,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
9.

Conference Proceedings
Conference Proceedings
9. Effect of developer temperature and normality on conventional and chemically amplified photoresist dissolution
Mack,C.A. ; Maslow,M.J. ; Byers,J.D.
Pub. info.: Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland.  pp.148-160,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3741
10.

Conference Proceedings
Conference Proceedings
10. Assessment of a hypothetical road map that extends optical lithography through the 70-nm technology node
Petersen,J.S. ; McCallum,M. ; Kachwala,N. ; Socha,R.J. ; Chen,J.F. ; Laidig,T.L. ; Smith,B.W. ; Gordon,R.L. ; Mack,C.A.
Pub. info.: Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland.  pp.73-89,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3741
11.

Conference Proceedings
Conference Proceedings
11. Diffusivity measurements in polymers:II.Residual casting solvent measurement by liquid scintillation counting
Gardiner,A.B. ; Qin,A. ; Henderson,C.L. ; Pancholi,S. ; Koros,W.J. ; Willson,C.G. ; Dammel,R.R. ; Mack,C.A. ; Hinsberg,W.D.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.850-860,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
12.

Conference Proceedings
Conference Proceedings
12. Diffusivity measurements in polymers:I.Lithographic modeling results
Mack,C.A. ; Mueller,K.E. ; Gardiner,A.B. ; Qin,A. ; Dammel,R.R. ; Koros,W.J. ; Willson,C.G.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.355-362,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
13.

Conference Proceedings
Conference Proceedings
13. Matching simulation and experiment for chemically amplified resists
Mack,C.A. ; Ercken,M. ; Moelants,M.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.183-192,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
14.

Conference Proceedings
Conference Proceedings
14. Modeling of projection electron lithography
Mack,C.A.
Pub. info.: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.245-254,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3997
15.

Conference Proceedings
Conference Proceedings
15. Diffusivity measurements in polymers:IV.Acid diffusion in chemically amplified resists
Mueller,K.E. ; Koros,W.J. ; Mack,C.A. ; Willson,C.G.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.706-711,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
16.

Conference Proceedings
Conference Proceedings
16. Modeling the effects of excimer laser bandwidths on lithographic performance
Kroyan,A. ; Bendik,J.J. ; Semprez,O. ; Farrar,N.R. ; Rowan,C.G. ; Mack,C.A.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.658-664,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
17.

Conference Proceedings
Conference Proceedings
17. Mask topography simulation for EUV lithography
Gordon,R.L. ; Mack,C.A.
Pub. info.: Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California.  Part1  pp.283-297,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3676
18.

Conference Proceedings
Conference Proceedings
18. Automatic calibration of lithography simulation parameters
Jug,S. ; Huang,R. ; Byers,J.D. ; Mack,C.A.
Pub. info.: Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK.  pp.380-395,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4404
19.

Conference Proceedings
Conference Proceedings
19. Electron-beam lithography simulation for mask making:V. Impact of GHOST proximity effect correction on process window
Mack,C.A. ; Sauer,C.A.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.2-20,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
20.

Conference Proceedings
Conference Proceedings
20. Development of analysis system for F2-excimer laser photochemical processes
Sekiguchi,A. ; Kadoi,M. ; Miyake,Y. ; Matsuzawa,T. ; Mack,C.A.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.395-412,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
21.

Conference Proceedings
Conference Proceedings
21. New model for the effect of developer temperature on photoresist dissolution
Mack,C.A. ; Maslow,M.J. ; Sekiguchi,A. ; Carplo,R.A.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 2  pp.1218-1231,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
22.

Conference Proceedings
Conference Proceedings
22. Metal layer process characterization: statistical and computation methods for handling,interpreting,and reacting to in-line critical dimension information
Qey,J. ; Mack,P.F. ; Mack,C.A.
Pub. info.: In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing II :23-24 September 1998 Santa Clara, California.  pp.164-178,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3509
23.

Conference Proceedings
Conference Proceedings
23. Measurement and analysis of reticle and wafer-level contributions to total CD variation
Preil,M. ; Mack,C.A.
Pub. info.: Microlithographic Techniques in Integrated Circuit Fabrication II.  pp.169-177,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4226
24.

Conference Proceedings
Conference Proceedings
24. Corner rounding and line-end shortening in optical lithography
Mack,C.A.
Pub. info.: Microlithographic Techniques in Integrated Circuit Fabrication II.  pp.83-92,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4226
25.

Conference Proceedings
Conference Proceedings
25. Accuracy of 3D optical lithography simulation for advanced reticles
Hollman,R.F. ; Mack,C.A.
Pub. info.: 17th Annual BACUS Symposium on Photomask Technology and Management.  pp.424-429,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3236
26.

Conference Proceedings
Conference Proceedings
26. Electron-beam lithography simulation for mask making: II. Comparison of the lithographic performance of PBS and EBR 900-M1
Sauer,C.A. ; Alexander,D. ; Mack,C.A.
Pub. info.: 17th Annual BACUS Symposium on Photomask Technology and Management.  pp.413-423,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3236
27.

Conference Proceedings
Conference Proceedings
27. Resolution and depth of focus in optical lithography
Mack,C.A.
Pub. info.: Microlithographic Techniques in IC Fabrication.  pp.14-29,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3183
28.

Conference Proceedings
Conference Proceedings
28. Resist metrology for lithography simulation,part 2:development parameter measurements
Sekiguchi,A. ; Mack,C.A. ; Minami,Y. ; Matsuzawa,T.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.49-63,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725
29.

Conference Proceedings
Conference Proceedings
29. Evaluation of proximity effects using three-dimensional optical lithography simulation
Mack,C.A.
Pub. info.: Optical Microlithography IX.  Part2  pp.634-639,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726
30.

Conference Proceedings
Conference Proceedings
30. Impact of illumination coherence and polarization on the imaging of attenuated phase-shift masks
Ma,Z.M. ; Mack,C.A.
Pub. info.: Optical Microlithography XIV.  4346  pp.1522-1532,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
31.

Conference Proceedings
Conference Proceedings
31. Phase phirst! An improved strong-PSM paradigm
Levenson,M.D. ; Petersen,J.S. ; Gerold,D.G. ; Mack,C.A.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.395-404,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
32.

Conference Proceedings
Conference Proceedings
32. The MEEF shall inherit the Earth
Conley,W. ; Garza,C.M. ; Dusa,M.V. ; Socha,R.J. ; Bendik,J.J. ; Mack,C.A.
Pub. info.: Optical Microlithography XIV.  4346  pp.251-258,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
33.

Conference Proceedings
Conference Proceedings
33. Lithography performance of contact holes:II.Simulation of effects of reticle corner rounding on wafer print performance
Mack,C.A. ; Sauer,C.A. ; Chabala,J.M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.172-179,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
34.

Conference Proceedings
Conference Proceedings
34. Comprehensive simulation of e-beam lithography processes using PROLITH/3D and TEMPTATION software tools
Kuzmin,I.YU. ; Mack,C.A.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.503-507,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
35.

Conference Proceedings
Conference Proceedings
35. Examination of a simplified reaction-diffusion model for post-exposure bake of chemically amplified resists
Smith,M.D. ; Mack,C.A.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.1022-1036,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
36.

Conference Proceedings
Conference Proceedings
36. Understanding molecular-level effects during post-exposure processing
Schmid,G.M. ; Smith,M.D. ; Mack,C.A. ; Singh,V.K. ; Burns,S.D. ; Willson,C.G.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.1037-1047,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
37.

Conference Proceedings
Conference Proceedings
37. Modeling the impact of thermal history during post-exposure bake on the lithographic performance of chemically amplified resists
Smith,M.D. ; Mack,C.A. ; Petersen,J.S.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.1013-1021,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
38.

Conference Proceedings
Conference Proceedings
38. Process-specific tuning of lithography simulation tools
Mason,M.E. ; Soper,R.A. ; Terry,R.M. ; Mack,C.A.
Pub. info.: Optical Microlithography X.  pp.491-498,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
39.

Conference Proceedings
Conference Proceedings
39. Methodology for utilizing CD distributions for optimization of lithographic processes
Charrier,E.W. ; Mack,C.A. ; Zuo,Q. ; Maslow,M.
Pub. info.: Optical Microlithography X.  pp.541-551,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
40.

Conference Proceedings
Conference Proceedings
40. Comparison of simulated and experimental CD-limited yield for a submicron i-line process
Charrier,E.W. ; Progler,C.J. ; Mack,C.A.
Pub. info.: Microelectronic Manufacturing Yield, Reliability, and Failure Analysis.  pp.84-94,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2635
41.

Conference Proceedings
Conference Proceedings
41. Lithographic simulation: a review
Mack,C.A.
Pub. info.: Lithographic and Micromachining Techniques for Optical Component Fabrication.  pp.59-72,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4440
42.

Conference Proceedings
Conference Proceedings
42. Electron-beam lithography simulation for mask making: ？. Comparison of 10- and 50-kV GHOST proximity effect correction
Mack,C.A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.194-203,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
43.

Conference Proceedings
Conference Proceedings
43. Characterization of optical proximity correction features
Allgair,J.A. ; Ivy,M. ; Lucas,K. ; Sturtevant,J.L. ; Elliott,R.C. ; Mack,C.A. ; MacNaughton,C.W. ; Miller,J.D. ; Pochkowski,M. ; Preil,M.E. ; Robinson,J.C. ; Santos,F.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.200-207,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
44.

Conference Proceedings
Conference Proceedings
44. Application of critical shape analyses to two-dimensional patterns
Pochkowski,M. ; Mack,C.A. ; Kasprowicz,B.S.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.169-176,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
45.

Conference Proceedings
Conference Proceedings
45. Metrology and analysis of two-dimensional SEM patterns
Mack,C.A. ; Jug,S. ; Jones,R. ; Apte,P. ; Williams,S. ; Pochkowski,M.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.377-384,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
46.

Conference Proceedings
Conference Proceedings
46. Impact of graybeam method of virtual address reduction on image quality
Mack,C.A.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.537-544,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
47.

Conference Proceedings
Conference Proceedings
47. Characterization of quartz-etched PSM masks for KrF lithography at the 100-nm node
Rhyins,P. ; Fritze,M. ; Chan,D. ; Carney,C. ; Blachowicz,B.A. ; Vieira,M. ; Mack,C.A.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.486-495,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
48.

Conference Proceedings
Conference Proceedings
48. Electron-beam lithography simulation for mask making:III. Effect of spot size,address grid,and raster writing strategies on lithography performance with PBS and ZEP-7000
Mack,C.A.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.32-44,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546
49.

Conference Proceedings
Conference Proceedings
49. Electron-beam lithography simulation for mask making: I
Mack,C.A.
Pub. info.: 17th Annual BACUS Symposium on Photomask Technology and Management.  pp.216-227,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3236
50.

Conference Proceedings
Conference Proceedings
50. Design and analysis of manufacturable alternating phase-shifting masks
Gordon,R.L. ; Mack,C.A. ; Petersen,J.S.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.606-616,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546
51.

Conference Proceedings
Conference Proceedings
51. Assessment of a hypothetical roadmap that extends optical lithography through the 70-nm technology node
Petersen,J.S. ; McCallum,M. ; Kachwala,N. ; Socha,R.J. ; Chen,J.F. ; Laidig,T.L. ; Smith,B.W. ; Gordon,R.L. ; Mack,C.A.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.288-303,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546
52.

Conference Proceedings
Conference Proceedings
52. Resist metrology for lithography simulation,part I:exposure parameter measurements
Mack,C.A. ; Matsuzawa,T. ; Sekiguchi,A. ; Minami,Y.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.34-48,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725
53.

Conference Proceedings
Conference Proceedings
53. Lithography model tuning:matching simulation to experiment
Thornton,S.H. ; Mack,C.A.
Pub. info.: Optical Microlithography IX.  Part1  pp.223-235,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726