1.

Conference Proceedings
Conference Proceedings
1. Improved simulation of photoresists using new development models
Dammel,R.R. ; Sagan,J.P. ; Kokinda,E. ; Eilbeck,N. ; Mack,C.A. ; Arthur,G.G. ; Henderson,C.L. ; Scheer,S.A. ; Rathsack,B.M. ; Willson,C.G.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.401-416,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
2.

Conference Proceedings
Conference Proceedings
2. Diffusivity measurements in polymers:II.Residual casting solvent measurement by liquid scintillation counting
Gardiner,A.B. ; Qin,A. ; Henderson,C.L. ; Pancholi,S. ; Koros,W.J. ; Willson,C.G. ; Dammel,R.R. ; Mack,C.A. ; Hinsberg,W.D.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.850-860,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
3.

Conference Proceedings
Conference Proceedings
3. Diffusivity measurements in polymers:I.Lithographic modeling results
Mack,C.A. ; Mueller,K.E. ; Gardiner,A.B. ; Qin,A. ; Dammel,R.R. ; Koros,W.J. ; Willson,C.G.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.355-362,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
4.

Conference Proceedings
Conference Proceedings
4. Diffusivity measurements in polymers:IV.Acid diffusion in chemically amplified resists
Mueller,K.E. ; Koros,W.J. ; Mack,C.A. ; Willson,C.G.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.706-711,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
5.

Conference Proceedings
Conference Proceedings
5. Understanding molecular-level effects during post-exposure processing
Schmid,G.M. ; Smith,M.D. ; Mack,C.A. ; Singh,V.K. ; Burns,S.D. ; Willson,C.G.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.1037-1047,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345