1.

Conference Proceedings
Conference Proceedings
1. Assessment of a hypothetical road map that extends optical lithography through the 70-nm technology node
Petersen,J.S. ; McCallum,M. ; Kachwala,N. ; Socha,R.J. ; Chen,J.F. ; Laidig,T.L. ; Smith,B.W. ; Gordon,R.L. ; Mack,C.A.
Pub. info.: Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland.  pp.73-89,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3741
2.

Conference Proceedings
Conference Proceedings
2. Phase phirst! An improved strong-PSM paradigm
Levenson,M.D. ; Petersen,J.S. ; Gerold,D.G. ; Mack,C.A.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.395-404,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
3.

Conference Proceedings
Conference Proceedings
3. Modeling the impact of thermal history during post-exposure bake on the lithographic performance of chemically amplified resists
Smith,M.D. ; Mack,C.A. ; Petersen,J.S.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.1013-1021,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
4.

Conference Proceedings
Conference Proceedings
4. Design and analysis of manufacturable alternating phase-shifting masks
Gordon,R.L. ; Mack,C.A. ; Petersen,J.S.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.606-616,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546
5.

Conference Proceedings
Conference Proceedings
5. Assessment of a hypothetical roadmap that extends optical lithography through the 70-nm technology node
Petersen,J.S. ; McCallum,M. ; Kachwala,N. ; Socha,R.J. ; Chen,J.F. ; Laidig,T.L. ; Smith,B.W. ; Gordon,R.L. ; Mack,C.A.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.288-303,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546