1.

Conference Proceedings
Conference Proceedings
1. Synthesis and properties of new anionic photoacid generators bound polymer resists for e-beam and EUV lithography
M. Wang ; C.-T. Lee ; C. L. Henderson ; W. Yueh ; J. M. Roberts
Pub. info.: Advances in resist materials and processing technology XXV.  1  pp.692312-1-692312-7,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6923
2.

Conference Proceedings
Conference Proceedings
2. Novel anionic photoacid generator (PAGs) and photoresist for sub-50-nm patterning by EUVL and EBL
M. Wang ; C. Lee ; C. L. Henderson ; W. Yueh ; J. M. Roberts ; K. E. Gonsalves
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
3.

Conference Proceedings
Conference Proceedings
3. Photosensitivity and line-edge roughness of novel polymer-bound PAG photoresists
C. Lee ; M. Wang ; N. D. Jarnagin ; K. E. Gonsalves ; J. M. Roberts ; W. Yueh ; C. L. Henderson
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
4.

Conference Proceedings
Conference Proceedings
4. Novel polymeric anionic photo-acid generators (PAGs) and photoresists for sub-100-nm patterning by 193-nm lithography
M. Wang ; N. D. Jarnagin ; W. Yueh ; J. M. Roberts ; M. Tapia-Tapia ; N. Batina ; K. E. Gonsalves
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
5.

Conference Proceedings
Conference Proceedings
5. Effect of PAG and matrix structure on PAG acid generation behavior under UV and high- energy radiation exposure
C.-T. Lee ; M. Wang ; K. E. Gonsalves ; W. Yueh ; J. M. Roberts
Pub. info.: Advances in resist materials and processing technology XXV.  2  pp.69232F-1-69232F-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6923