1.

Conference Proceedings
Conference Proceedings
1. Correlation Between High-K Properties and Interfacial Chemical Structure of ALD HhO2 Thin Films on Si, Sil-xGex and Ge Substrates
T. Park ; J. Kim ; J. Jang ; M. Seo ; C. Hwang
Pub. info.: Physics and technology of high-k gate dielectrics 4.  pp.111-120,  2006.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 3(3)
2.

Conference Proceedings
Conference Proceedings
2. The Improvement in Dielectric Characteristics and Reliability of Atomic-Layer-Deposited HfO₂ Thin Films by In-Situ NH₃ Injection
J. Kim ; T. Park ; M. Cho ; M. Seo ; J. Jang ; C. Hwang
Pub. info.: Physics and technology of high-k gate dielectrics 4.  pp.435-440,  2006.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 3(3)