1.

Conference Proceedings
Conference Proceedings
1. Anti-bubble topcoat for immersion lithography
Paulsson, A. ; Xing, K. ; Fosshaug, H. ; Lundvall, A. ; Bjornberg, C. ; Karlsson, J.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.527-536,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
2.

Conference Proceedings
Conference Proceedings
2. High performance FEP-171 resist process in combination with NTAR7 and NTAR5 chrome and the Sigma7300 DUV mask writer [5853-04]
Xing, K. ; Karlsson, J. ; Paulson, A. ; Bjornberg, C. ; Lundvall, A. ; Hogfeldt, P. ; Vedenpaa, J. ; Goodoree, R. ; Bjuggren, M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.31-41,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853