Xing, K. ; Karlsson, J. ; Paulson, A. ; Bjornberg, C. ; Lundvall, A. ; Hogfeldt, P. ; Vedenpaa, J. ; Goodoree, R. ; Bjuggren, M.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology XII. pp.31-41, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering