1.

Conference Proceedings
Conference Proceedings
1. A high-resolution contamination-mode inspection method providing a complete solution to the inspection challenges for advanced photomasks
Bhattacharyya, K. ; Huang, Y.-T. ; Son, K. ; Wang, D. ; Liu, L. ; Liao, C.H. ; Dai, Y.-M. ; Lin, J.-C.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.744-752,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
2.

Conference Proceedings
Conference Proceedings
2. High-resolution reticle inspection technique providing a complete reticle qualification solution in advanced 90-nm node wafer fabs
Liu, L. ; Liao, C.-H. ; Dai, Y.-M. ; Lin, J.-C. ; Bhattacharyya, K. ; Huang, Y.-T. ; Son, K. ; Wang, D.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.431-439,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256