1.

Conference Proceedings
Conference Proceedings
1. Study of 157nm resists with full field exposure tools
Hsu, R. H. ; Huang, I. H. ; Lin, L. C. ; Lin, B. S.-M.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.572-583,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
2.

Conference Proceedings
Conference Proceedings
2. AFM measurement of linewidth with sub-nanometer scale precision
Tseng, H. T. ; Lin, L.-C. ; Huang, I. H. ; Lin, B. S.-M. ; Huang, C.-C. K. ; Huang, C.-J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XIX.  pp.156-162,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5752