1.

Conference Proceedings
Conference Proceedings
1. Electrical linewidth measurement for next-generation lithography
Kye,J. ; Levinson,H.J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.637-643,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
2.

Conference Proceedings
Conference Proceedings
2. Linewidth asymmetry study to predict aberration in lithographic lenses
Kye,J. ; Dusa,M.V. ; Levinson,H.J.
Pub. info.: Optical Microlithography XIV.  4346  pp.1280-1289,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346