1.

Conference Proceedings
Conference Proceedings
1. Electrical Defects in Atomic Layer Deposited HfO2 Films on Silicon: Influence ofPrecursor Chemistries and Substrate Treatment
Duenas, S. ; Castan, H. ; Garcia, H. ; Bailon, L. ; KuKli, K. ; Ritala, M. ; Leskela, M.
Pub. info.: Defects in high-κ gate dielectric stacks : nano-electronic semiconductor devices.  pp.287-299,  2006.  Dordrecht.  Springer
Title of ser.: NATO science series. Series 2, Mathematics, physics and chemistry
Ser. no.: 220
2.

Conference Proceedings
Conference Proceedings
2. On the Interface Quality of MIS Structures Fabricated From Atomic Layer Deposition of HfO2, Ta2O5 and Nb2O5-Ta2O5-Nb2O5 Dielectric Thin Films
Duenas, S. ; Castan, H. ; Garcia, H. ; Barbolla, J. ; Kukli, K. ; Ritala, M. ; Leskela, M.
Pub. info.: Fundamentals of novel oxide/semiconductor interfaces : symposium held December 1-4, 2003, Boston, Massachusetts, U.S.A..  pp.147-152,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 786