1.

Conference Proceedings
Conference Proceedings
1. Gray-scale handwritten character recognition based on principal features
Park,H.-S. ; Kim,S.-Y. ; Lee,S.-W.
Pub. info.: Document recognition IV : 12-13 February, 1997, San Jose, California.  pp.40-49,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3027
2.

Conference Proceedings
Conference Proceedings
2. Reduction of wafer-scale error between DI and FI in multilevel metallization hy adjusting edge detedion method
Bae,S.-G. ; Kim,Y.-K. ; Park,K.-Y. ; Kim,J.-S. ; Lee,W.-G. ; Lee,S.-W. ; Lee,D.-H.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.460-469,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
3.

Conference Proceedings
Conference Proceedings
3. Integrated segmentation and recognition of connected handwritten characters with recurrent neural network
Lee,S.-W. ; Lee,E.-J.
Pub. info.: Document recognition III : 29-30 January, 1996, San Jose, California.  pp.251-261,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2660
4.

Conference Proceedings
Conference Proceedings
4. High-density optical disk readout using a blue laser diode and a transparent plastic substrate with 0.3-mm thickness
Park,K.-C. ; Lee,T.-S. ; Kim,H.-N. ; Jeong,S.-Y. ; Ahn,S.-K. ; Kim,J.-Y. ; Lee,J.-S. ; Kim,J.-B. ; Lee,S.-W. ; Lee,D.-C. ; Asai,I.
Pub. info.: Optical data storage 2000 : 14-17 May, 2000, Whistler, Canada.  pp.43-47,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4090
5.

Conference Proceedings
Conference Proceedings
5. Improvement of resist profile roughness in bilayer resist process
Jeong,C.-Y. ; Ryu,S. ; Park,K.-Y. ; Lee,W.G. ; Lee,S.-W. ; Lee,D.-H.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.818-826,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
6.

Conference Proceedings
Conference Proceedings
6. TuD27 ｢｣ High-density optical disk readout using a blue violet laser diode
Park,K.-C. ; Kim,H.-N. ; Jeong,S.-Y. ; Ahn,S.-K. ; Lee,T.-S. ; Lee,S.-W. ; Lee,D.-C. ; Kim,J.-Y.
Pub. info.: ISOM/ODS '99 : joint international symposium on Optical Memory and Optical Data Strage 1999, 11-15 July 1999 Sheraton Kauai Resort, Koloa, Howaii.  Supplement  pp.416-418,  1999.  Bellingham, Washington.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3864
7.

Conference Proceedings
Conference Proceedings
7. Search for Optimum Structural Parameters of Soft X-Ray Mirrors by Computer Simulation,
Lee,S.-W. ; Cha,D.-H. ; Kim,D.-E.
Pub. info.: Optics for science and new technology : 17th Congress of the International Commission for Optics, August 19-23, 1996, Hotel Riviera(Yusong), Taejon Korea.  Part2  pp.1226-1227,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2778
8.

Conference Proceedings
Conference Proceedings
8. Mo-Ei Multilayer as Soft X-ray Mirrors for the Wavelengths around 20 nm Region,
Kim,D.-E. ; Lee,S.-W.
Pub. info.: Optics for science and new technology : 17th Congress of the International Commission for Optics, August 19-23, 1996, Hotel Riviera(Yusong), Taejon Korea.  Part2  pp.1224-1225,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2778
9.

Conference Proceedings
Conference Proceedings
9. Doubly exposed patterning characteristics using two alternating phase-shift masks
Lee,S.-W. ; Shin,I.-G. ; Kim,Y.-H. ; Choi,S.-W. ; Han,W.-S. ; Yoon,H.-S. ; Sohn,J.-M.
Pub. info.: 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.32-36,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4349
10.

Conference Proceedings
Conference Proceedings
10. Analysis of dry etch loading effect in mask fabrication
Lee,J.-Y. ; Cho,S.-Y. ; Kim,C.-H. ; Lee,S.-W. ; Choi,S.-W. ; Han,W.-S. ; Sohn,J.-M.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.609-615,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
11.

Conference Proceedings
Conference Proceedings
11. Doubly exposed patterning using mutually one-pitch step-shifted alternating phase-shift masks
Lee,S.-W. ; Chung,D.-H. ; Shin,I.-G. ; Kim,Y.-H. ; Choi,S.-W. ; Han,W.-S. ; Sohn,J.-M.
Pub. info.: Optical Microlithography XIV.  4346  pp.762-769,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
12.

Conference Proceedings
Conference Proceedings
12. Improvement of defect density for DUV halftone PSM
Lee,K.-Y. ; Kim,L.-J. ; Yeon,K.-M. ; Lee,S.-W. ; Kim,H.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.388-393,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
13.

Conference Proceedings
Conference Proceedings
13. Effect of mask reduction ratio in alternating phase-shift masks
Shin,I.-G. ; Lee,S.-W. ; Kim,Y.-H. ; Choi,S.-W. ; Han,W.-S. ; Sohn,J.-M. ; Lim,T.-K.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.309-315,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
14.

Conference Proceedings
Conference Proceedings
14. Impact of ArF attenuated PSM using multishifter layer (TiN/Si3N4) for next-generation lithography
Nam,K.-H. ; Kim,L.-J. ; Jeong,H.-S. ; Lee,S.-W. ; Lee,I.-S. ; Shin,C. ; Kim,H.-S. ; Dieu,L. ; Paek,S.W. ; Koo,S.-S. ; Bae,S.-M. ; Ham,Y.-M. ; Shin,K.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.70-80,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
15.

Conference Proceedings
Conference Proceedings
15. Experimental approaches for assessing interfacial behavior of polymer films during dissolution in aqueous base
Hinsberg,W.D. ; Lee,S.-W. ; Ito,H. ; Horne,D.E. ; Kanazawa,K.K.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.1-9,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345