1.

Conference Proceedings
Conference Proceedings
1. Doubly exposed patterning characteristics using two alternating phase-shift masks
Lee,S.-W. ; Shin,I.-G. ; Kim,Y.-H. ; Choi,S.-W. ; Han,W.-S. ; Yoon,H.-S. ; Sohn,J.-M.
Pub. info.: 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.32-36,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4349
2.

Conference Proceedings
Conference Proceedings
2. Doubly exposed patterning using mutually one-pitch step-shifted alternating phase-shift masks
Lee,S.-W. ; Chung,D.-H. ; Shin,I.-G. ; Kim,Y.-H. ; Choi,S.-W. ; Han,W.-S. ; Sohn,J.-M.
Pub. info.: Optical Microlithography XIV.  4346  pp.762-769,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
3.

Conference Proceedings
Conference Proceedings
3. Effect of mask reduction ratio in alternating phase-shift masks
Shin,I.-G. ; Lee,S.-W. ; Kim,Y.-H. ; Choi,S.-W. ; Han,W.-S. ; Sohn,J.-M. ; Lim,T.-K.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.309-315,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186