1.

Conference Proceedings
Conference Proceedings
1. Practical approach to control the full-chip-level gate CD in DUV lithography
Park,C.-H. ; Kim,Y.-H. ; Lee,H.-J. ; Kong,J.-T. ; Lee,S.-H.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.215-223,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
2.

Conference Proceedings
Conference Proceedings
2. Three-dimensional electron-beam lithography simulator V2.O for the gigabit-era photomask manufacturing
Kim.Y.-H ; Cha.B.-C ; Lee,H.-J. ; Sohn,J.-M. ; Kong,J.-T. ; Lee,S.-H.
Pub. info.: 17th Annual BACUS Symposium on Photomask Technology and Management.  pp.358-365,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3236