1.

Conference Proceedings
Conference Proceedings
1. Laser alignment strictness for optical diffraction effect in lithography processes
Lin,H.-P. ; Lee,C.-H. ; Lo,Y.-C. ; Lu,K.L.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.986-996,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
2.

Conference Proceedings
Conference Proceedings
2. Optimizing the clean effect of wafer backside in lithography developer process
Lin,H.-P. ; Chang,C.-H. ; Lee,C.-H. ; Pang,S.L. ; Lu,K.L.
Pub. info.: Process, equipment, and materials control in integrated circuit manufacturing V : 22-23 September, 1999, Santa Clara, California.  pp.193-199,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3882
3.

Conference Proceedings
Conference Proceedings
3. Relation between film character and wafer alignment: critical alignment issues on HV device for VLSI manufacturing
Lo,Y.-C. ; Lee,C.-H. ; Lin,H.-P. ; Peng,C.-S.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.686-695,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
4.

Conference Proceedings
Conference Proceedings
4. Verifying and preventing recurrence in metal defects for VLSI manufacturing
Lin,H.-P. ; Lee,C.-H. ; Lo,Y.-C. ; Liao,C.-H. ; Lu,K. L.
Pub. info.: Process, Equipment, and Materials Control in Integrated Circuit Manufacturing III.  pp.50-61,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3213