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Conference Proceedings

1. Comparison of best process focus and machine focus

Lo,Y.-C. ; Lee,C.-H. ; Fan,Y.-T. ; Chang,C.-K. ; Lu,K.L.

Pub. info.:	Process, Equipment, and Materials Control in Integrated Circuit Manufacturing III. pp.241-248, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3213

Conference Proceedings

2. Best process focus and machine focus: adding focus offset to optimize photolithography process for VLSI manufacturing

Lo,Y.-C. ; Lee,C.-H. ; Fan,Y.-T. ; Chang,C.-K.

Pub. info.:	Microlithographic Techniques in IC Fabrication. pp.186-195, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3183