1.

Conference Proceedings
Conference Proceedings
1. Cycloolefin copolymer containing hindered hydroxyl group for 1 93nm photoresist
Kim, S.-K. ; An, I. ; Oh, H.-K. ; Lee, S. M. ; Bok, C. K. ; Moon, S. C.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.592-602,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
2.

Conference Proceedings
Conference Proceedings
2. Nanomolecular resists with adamantane core for 193-nm lithography
Kim, S.-K. ; An, I. ; Oh, H.-K. ; Lee, S. M. ; Bok, C. K. ; Moon, S. C.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.603-610,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)