1.

Conference Proceedings
Conference Proceedings
1. EFFECTS OF POST ETCH TREATMENTS ON CONTAMINATED SILICON SURFACE DUE TO CHF3/C2F6 REACTIVE ION ETCHING
Park, H.-H. ; Kwon, K.-H. ; Lee, S.-H. ; Nahm, S. ; Lee, J.-W. ; Koak, B.-H. ; Suh, K.-S. ; Kwon, O.-J. ; Lee, J.-L. ; Yeom, G.-Y.
Pub. info.: Surface chemical cleaning and passivation for semiconductor processing.  pp.243-,  1993.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 315
2.

Conference Proceedings
Conference Proceedings
2. Organosiloxane based bottom antireflective coatings for 193nm lithography
Son, E.-K. ; Kim, J.-W. ; Lee, S.-H. ; Park, C.-S. ; Lee, J.-W. ; Kim, J. ; Lee, G.-S. ; Lee, S.-K. ; Ban, K.-D. ; Jung, J.-C. ; Bok, C. K. ; Moon, S.-C.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.449-458,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)