1.

Conference Proceedings
Conference Proceedings
1. CA resist with high sensitivity and sub-100-nm resolution for advanced mask and device making
Kwong,R.W. ; Huang,W.-S. ; Hartley,J.G. ; Moreau,W.M. ; Robinson,C. ; Angelopoulos,M. ; Magg,C. ; Lawliss,M.
Pub. info.: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.352-360,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3997
2.

Conference Proceedings
Conference Proceedings
2. Performance of the EL-4+ maskwriter for advanced chrome on glass reticles
Caldwell,N. ; Jeffer,R. ; Lawliss,M. ; Hartley,J.G.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.493-500,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
3.

Conference Proceedings
Conference Proceedings
3. CA resist with high sensitivity and sub-100-nm resolution for advanced mask making
Huang,W.-S. ; Kwong,R.W. ; Hartley,J.G. ; Moreau,W.M. ; Angelopoulos,M. ; Magg,C. ; Lawliss,M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.150-159,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066