Lercel, M.J. ; Williams, C.T. ; Lawliss, M. ; Ackel, R. ; Kindt, L. ; Fisch, E.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology IX. pp.790-798, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering