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12 results

Conference Proceedings

1. Application of CPL with Interference Mapping Lithography to generate random contact reticle designs for the 65-nm node

Van Den Broeke, D.J. ; Laidig, T.L. ; Chen, J.F. ; Wampler, K.E. ; Hsu, S.D. ; Shi, X. ; Socha, R.J. ; Dusa, M.V. ; Corcoran, N.P.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XI. pp.550-559, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5446

Conference Proceedings

2. Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond

Hsu, S.D. ; Corcoran, N.P. ; Eurlings, M. ; Knose, W.T. ; Laidig, T.L. ; Wampler, K.E. ; Roy, S. ; Shi, X. ; Hsu, C.M. ; Chen, J.F. ; Finders, J. ; Socha, R.J. ; Dusa, M.V.

Pub. info.:	Optical Microlithography XV. Part One pp.476-490, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4691

Conference Proceedings

3. 65-nm full-chip implementation using double dipole lithography

Hsu, S.D. ; Chen, J.F. ; Cororan, N. ; Knose, W.T. ; Broeke, D.J.V.D. ; Laidig, T.L. ; Wampler, K.E. ; Shi, X. ; Hsu, C.M. ; Eurlings, M. ; Finders, J. ; Chiou, T.-B. ; Socha, R.J. ; Conley, W. ; Hsieh, Y.W. ; Tuan, S. ; Hsieh, F.

Pub. info.:	Optical Microlithography XVI. Part One pp.215-231, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

4. Tuning MEEF for CD control at 65-nm node based on chromeless phase lithography (CPL)

Van Den Broeke, D.J. ; Laidig, T.L. ; Wampler, K.E. ; Hsu, S. ; Shi, X. ; Hsu, M. ; Burchard, P. ; Chen, J.F.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part One pp.579-591, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

5. Mask design optimization for 70-nm technology node using chromeless phase lithography (CPL) based on 100% transmission phase-shifting mask

Chen, J.F. ; Van Den Broeke, D.J. ; Hsu, M. ; Laidig, T.L. ; Wampler, K.E. ; Shi, X. ; Hsu, S. ; Shafer, T.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology IX. pp.361-372, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4754

Conference Proceedings

6. Near-0.3 k1 full pitch range contact hole patterning using chromeless phase lithography (CPL)

Van Den Broeke, D.J. ; Socha, R. ; Hsu, S.D. ; Chen, J.F. ; Laidig, T.L. ; Corcoran, N. ; Hollerbach, U. ; Wampler, K.E. ; Shi, X.

Pub. info.:	23rd Annual BACUS Symposium on Photomask Technology. pp.297-308, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5256

Conference Proceedings

7. Contact hole reticle optimization by using interference mapping lithography (IML)

Socha, R.J. ; Van Den Broeke, D.J. ; Hsu, S.D. ; Chen, J.F. ; Laidig, T.L. ; Corcoran, N. ; Hollerbach, U. ; Wampler, K.E. ; Shi, X. ; Conley, W.

Pub. info.:	Optical Microlithography XVII. pp.222-240, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5377

Conference Proceedings

8. RET integration of CPL technology for random logic

Hsu, S.D. ; Van Den Broeke, D.J. ; Chen, J.F. ; Shi, X. ; Hsu, M. ; Laidig, T.L. ; Conley, W. ; Litt, L.C. ; Wu, W.

Pub. info.:	Optical Microlithography XVII. pp.510-526, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5377

Conference Proceedings

9. Full-chip manufacturing reliability check implementation for 90-nm and 65-nm nodes using CPL and DDL

Hsu, M. ; Laidig, T.L. ; Wampler, K.E. ; Hsu, S.D. ; Shi, X. ; Chen, J.F. ; Van Den Broeke, D.J. ; Hsieh, F.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XI. pp.402-413, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5446

10.

Conference Proceedings

10. Eigen-decomposition-based models for model OPC

Shi, X. ; Laidig, T.L. ; Chen, J.F. ; Van Den Broeke, D.J. ; Hsu, S.D. ; Hsu, M. ; Wampler, K.E. ; Hollerbach, U.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XI. pp.462-470, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5446

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