1.

Conference Proceedings
Conference Proceedings
1. Application of CPL with Interference Mapping Lithography to generate random contact reticle designs for the 65-nm node
Van Den Broeke, D.J. ; Laidig, T.L. ; Chen, J.F. ; Wampler, K.E. ; Hsu, S.D. ; Shi, X. ; Socha, R.J. ; Dusa, M.V. ; Corcoran, N.P.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.550-559,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
2.

Conference Proceedings
Conference Proceedings
2. Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond
Hsu, S.D. ; Corcoran, N.P. ; Eurlings, M. ; Knose, W.T. ; Laidig, T.L. ; Wampler, K.E. ; Roy, S. ; Shi, X. ; Hsu, C.M. ; Chen, J.F. ; Finders, J. ; Socha, R.J. ; Dusa, M.V.
Pub. info.: Optical Microlithography XV.  Part One  pp.476-490,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
3.

Conference Proceedings
Conference Proceedings
3. Application of CPL reticle technology for the 65- and 50-nm node
Conley, W. ; Broeke, D.J.V.D. ; Socha, R.J. ; Wu, W. ; Litt, L.C. ; Lucas, K. ; Nelson-Thomas, C.M. ; Roman, B.J. ; Chen, F. ; Wampler, K.E. ; Laidig, T.L. ; Hsu, S.D. ; Schaefer, E. ; Cassel, S. ; Yu, L. ; Kasprowicz, B.S. ; Progler, C.J. ; Petersen, J.S. ; Gerold, D.J. ; Maslow, M.J.
Pub. info.: Optical Microlithography XVI.  Part One  pp.392-398,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
4.

Conference Proceedings
Conference Proceedings
4. 65-nm full-chip implementation using double dipole lithography
Hsu, S.D. ; Chen, J.F. ; Cororan, N. ; Knose, W.T. ; Broeke, D.J.V.D. ; Laidig, T.L. ; Wampler, K.E. ; Shi, X. ; Hsu, C.M. ; Eurlings, M. ; Finders, J. ; Chiou, T.-B. ; Socha, R.J. ; Conley, W. ; Hsieh, Y.W. ; Tuan, S. ; Hsieh, F.
Pub. info.: Optical Microlithography XVI.  Part One  pp.215-231,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
5.

Conference Proceedings
Conference Proceedings
5. Near-0.3 k1 full pitch range contact hole patterning using chromeless phase lithography (CPL)
Van Den Broeke, D.J. ; Socha, R. ; Hsu, S.D. ; Chen, J.F. ; Laidig, T.L. ; Corcoran, N. ; Hollerbach, U. ; Wampler, K.E. ; Shi, X.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.297-308,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
6.

Conference Proceedings
Conference Proceedings
6. Contact hole reticle optimization by using interference mapping lithography (IML)
Socha, R.J. ; Van Den Broeke, D.J. ; Hsu, S.D. ; Chen, J.F. ; Laidig, T.L. ; Corcoran, N. ; Hollerbach, U. ; Wampler, K.E. ; Shi, X. ; Conley, W.
Pub. info.: Optical Microlithography XVII.  pp.222-240,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
7.

Conference Proceedings
Conference Proceedings
7. RET integration of CPL technology for random logic
Hsu, S.D. ; Van Den Broeke, D.J. ; Chen, J.F. ; Shi, X. ; Hsu, M. ; Laidig, T.L. ; Conley, W. ; Litt, L.C. ; Wu, W.
Pub. info.: Optical Microlithography XVII.  pp.510-526,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
8.

Conference Proceedings
Conference Proceedings
8. Experimental verification of a model-based decomposition method for double dipole lithography
Eurlings, M. ; Hsu, S.D. ; Hendrickx, E. ; op 't Root, W. ; Laidig, T.L. ; Chiou, T.-B. ; Chen, A. ; Chen, F. ; Vandenberghe, G. ; Finders, J.
Pub. info.: Optical Microlithography XVII.  pp.1225-1236,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
9.

Conference Proceedings
Conference Proceedings
9. Full-chip manufacturing reliability check implementation for 90-nm and 65-nm nodes using CPL and DDL
Hsu, M. ; Laidig, T.L. ; Wampler, K.E. ; Hsu, S.D. ; Shi, X. ; Chen, J.F. ; Van Den Broeke, D.J. ; Hsieh, F.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.402-413,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
10.

Conference Proceedings
Conference Proceedings
10. Eigen-decomposition-based models for model OPC
Shi, X. ; Laidig, T.L. ; Chen, J.F. ; Van Den Broeke, D.J. ; Hsu, S.D. ; Hsu, M. ; Wampler, K.E. ; Hollerbach, U.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.462-470,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446