1.

Conference Proceedings
Conference Proceedings
1. Implementation of adaptive site optimization in model-based OPC for minimizing ripples [6156-63]
Bahnas, M. ; Al-lmam M ; Seoud, A. ; LaCour, P. ; Ragai H F
Pub. info.: Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA.  pp.615615-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6156
2.

Conference Proceedings
Conference Proceedings
2. Impact of process variation on 65nm across-chip Iinewidth variation [6156-64]
Hong, L. ; Brist, T. ; LaCour, P. ; Sturtevant, J. ; Niehoff, M. ; Niedermaier, P.
Pub. info.: Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA.  pp.61560Q-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6156
3.

Conference Proceedings
Conference Proceedings
3. Optimization of the data preparation for variable-shape beam mask writing machines
Schulze, S.F. ; LaCour, P.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.222-232,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
4.

Conference Proceedings
Conference Proceedings
4. New stream format: progress report on containing data size explosion
LaCour, P. ; Reich, A.J. ; Nakagawa, K.H. ; Schulze, S.F. ; Grodd, L.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.214-221,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
5.

Conference Proceedings
Conference Proceedings
5. Considerations for the use of defocus models for OPC
Sturtevant, J. L. ; Torres, J. A. ; Word, J. ; Granik, Y. ; LaCour, P.
Pub. info.: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.427-436,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5756
6.

Conference Proceedings
Conference Proceedings
6. Assessing the impact of real world manufacturing lithography variations on post-OPC CD control
Sturtevant, J. L. ; Word, J. ; LaCour, P. ; Park, J. W. ; Smith, D.
Pub. info.: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.240-254,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5756
7.

Conference Proceedings
Conference Proceedings
7. Model-based OPC for sub-resolution assist feature enhanced layouts
LaCour, P. ; Pell, E.A. ; Granik, Y. ; Do, T.
Pub. info.: Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA.  pp.540-546,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4692
8.

Conference Proceedings
Conference Proceedings
8. Statistical data assessment for optimization of data preparation and manufacturing
Schulze, S.F. ; LaCour, P.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.286-292,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
9.

Conference Proceedings
Conference Proceedings
9. Strong phase-shitting optical maskless lithography for the 65 nm node and beyond
V., J.Word ; Torres, A. ; LaCour, P.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.465-475,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
10.

Conference Proceedings
Conference Proceedings
10. OASIS-based data preparation flows: progress report on containing data size explosion
Schulze, S.F. ; LaCour, P. ; Grodd, L.
Pub. info.: Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA.  pp.149-157,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5379
11.

Conference Proceedings
Conference Proceedings
11. Investigation of product design weaknesses using model-based OPC sensitivity analysis
Postnikov, S.V. ; Lucas, K. ; Garza, C.M. ; Wimmer, K. ; LaCour, P. ; Word, J.C.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.160-171,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
12.

Conference Proceedings
Conference Proceedings
12. Chip-level line-width prediction methodology
LaCour, P. ; Sahouria, E.Y. ; Granik, Y.
Pub. info.: Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA.  pp.328-335,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4692
13.

Conference Proceedings
Conference Proceedings
13. Model-based OPC considering process window aspects: a study
Schulze, S.F. ; Park, O. ; Zimmermann, R. ; Chen, M.-J. ; LaCour, P. ; Sahouria, E.Y. ; Granik, Y. ; Cobb, N.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1097-1105,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
14.

Conference Proceedings
Conference Proceedings
14. Implementation issues for production OPC
Schellenberg, F. M. ; LaCour, P.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.249-258,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748
15.

Conference Proceedings
Conference Proceedings
15. Present challenges and solutions in sampling and correction for 45 nm [6349-71]
Graur, I. ; AI-lmam, M. ; LaCour, P.
Pub. info.: Photomask Technology 2006.  pp.63491Y-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
16.

Conference Proceedings
Conference Proceedings
16. Improvements in post-OPC data constraints for enhanced process corrections [6154-134]
Burns, R. L. ; Cui, Y. ; Zhao, Z. ; Stobert, I. ; LaCour, P. ; Yehia, A. ; Madkour, K. ; Gheith , M. ; Seoud, A.
Pub. info.: Optical Microlithography XIX.  pp.61543G-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154