1.

Conference Proceedings
Conference Proceedings
1. Optimization of the data preparation for variable-shape beam mask writing machines
Schulze, S.F. ; LaCour, P.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.222-232,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
2.

Conference Proceedings
Conference Proceedings
2. New stream format: progress report on containing data size explosion
LaCour, P. ; Reich, A.J. ; Nakagawa, K.H. ; Schulze, S.F. ; Grodd, L.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.214-221,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
3.

Conference Proceedings
Conference Proceedings
3. Statistical data assessment for optimization of data preparation and manufacturing
Schulze, S.F. ; LaCour, P.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.286-292,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
4.

Conference Proceedings
Conference Proceedings
4. OASIS-based data preparation flows: progress report on containing data size explosion
Schulze, S.F. ; LaCour, P. ; Grodd, L.
Pub. info.: Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA.  pp.149-157,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5379
5.

Conference Proceedings
Conference Proceedings
5. Model-based OPC considering process window aspects: a study
Schulze, S.F. ; Park, O. ; Zimmermann, R. ; Chen, M.-J. ; LaCour, P. ; Sahouria, E.Y. ; Granik, Y. ; Cobb, N.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1097-1105,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691