1.

Conference Proceedings
Conference Proceedings
1. Recent Developments In Ultrathin Oxynitride And Oxide/Nitride Stacked Films Prepared By In-Situ RTP Multiprocessing
Bhat, M. ; Yoon, G.W. ; Kim, J. ; Han, L,K. ; Yan, J. ; Wristers, D. ; Kwong, D.L.
Pub. info.: Proceedings of the third Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films.  pp.317-327,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-16
2.

Conference Proceedings
Conference Proceedings
2. High Quality Oxynitride Gate Dielectrics Prepared by Reoxidation of NH3-Nitrided SiO2 and N2O-Oxide in N2O Ambient
Han, L.K. ; Kim, J. ; Wang, H.H. ; Yan, J. ; Kwong, D.L.
Pub. info.: ULSI science and technology, 1995 : proceedings of the Fifth International Symposium on Ultra Large Scale Integration Science and Technology.  pp.485-494,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-5
3.

Conference Proceedings
Conference Proceedings
3. N2O-Based Gate Dielectrics for ULSI Applications
Kim, J. ; Yoon, G.W. ; Lo, G.Q. ; Ahn, J. ; Kwong, D.L.
Pub. info.: Proceedings of the Symposium on the Degradation of Electronic Devices due to Device Operation as well as Crystalline and Process-Induced Defects.  pp.25-35,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-1