1.

Conference Proceedings
Conference Proceedings
1. Unified mask data formats for EB writers
Kuriyama, K. ; Suzuki, T. ; Hirumi, J. ; Yoshioka, N. ; Hojo, Y. ; Kawase, Y. ; Hara, S. ; Hoga, M. ; Watanabe, S.W. ; Inoue, M. ; Kawase, H. ; Kamimoto, T.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.660-671,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
2.

Conference Proceedings
Conference Proceedings
2. Enhancement of unified mask data formats for EB writers
Suzuki, T. ; Hirumi, J. ; Yoshioka, N. ; Hojyo, Y. ; Kawase, Y. ; Sakamoto, S. ; Kuriyama, K. ; Narukawa, S. ; Houga, M.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.1186-1194,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
3.

Conference Proceedings
Conference Proceedings
3. Investigation of an enhanced mask data preparation system using unified mask data formats
Suzuki, T. ; Kuriyama, K. ; Hirumi, J. ; Yoshioka, N. ; Kawase, H. ; Kamimoto, T.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.785-792,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
4.

Conference Proceedings
Conference Proceedings
4. Improvement of unified mask data formats for EB writers
Suzuki, T. ; Hirumi, J. ; Yoshioka, N. ; Hojyo, Y. ; Kawase, Y. ; Hara, S. ; Kuriyama, K. ; Hoga, M. ; Watanabe, S.W. ; Kawase, H. ; Kamimoto, T. ; Kato, K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.414-421,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
5.

Conference Proceedings
Conference Proceedings
5. Advanced mask rule check (MRC) tool [6283-98]
Kato, K. ; Nishizawa, K. ; Inoue, T. ; Kuriyama, K. ; Suzuki, T. ; Narukawa, S. ; Hayashi, N. ; Dai Nippon Printing Co., Ltd. (Japan)
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62830O-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
6.

Conference Proceedings
Conference Proceedings
6. Evaluation of OASIS. VSB (SEMI P44) for practical use [6283-58]
Kuriyama, K. ; Suzuki, T. ; Narukawa, S. ; Mohri, H. ; Hoga, M. ; Hayashi, N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62832O-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
7.

Conference Proceedings
Conference Proceedings
7. The unified mask data format based on OASIS for VSB EB writers [5853-101]
Suzuki, T. ; Hirumi, J. ; Hojyo, Y. ; Kawase, Y. ; Sakamoto, S. ; Kuriyama, K. ; Narukawa, S. ; Hoga, M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.152-159,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853