1.

Conference Proceedings
Conference Proceedings
1. Unified mask data formats for EB writers
Kuriyama, K. ; Suzuki, T. ; Hirumi, J. ; Yoshioka, N. ; Hojo, Y. ; Kawase, Y. ; Hara, S. ; Hoga, M. ; Watanabe, S.W. ; Inoue, M. ; Kawase, H. ; Kamimoto, T.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.660-671,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
2.

Conference Proceedings
Conference Proceedings
2. Shot number analysis at 65-nm node mask writing using VSB writer
Hirumi, J. ; Kuriyama, K. ; Yoshioka, N. ; Yoshikawa, R. ; Hojo, Y. ; Matuzaka, T. ; Tanaka, K. ; Hoga, M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.309-317,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
3.

Conference Proceedings
Conference Proceedings
3. Development of new stream format with GDSII upper compatibility and high compression rate
Kuriyama, K. ; Hirumi, J. ; Yoshioka, N. ; Hojo, Y. ; Kawase, Y. ; Hara, S. ; Hoga, M. ; Watanabe, S.W. ; Inoue, M. ; Kawase, H. ; Kamimoto, T.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.83-93,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
4.

Conference Proceedings
Conference Proceedings
4. Improvement of unified mask data formats for EB writers
Suzuki, T. ; Hirumi, J. ; Yoshioka, N. ; Hojyo, Y. ; Kawase, Y. ; Hara, S. ; Kuriyama, K. ; Hoga, M. ; Watanabe, S.W. ; Kawase, H. ; Kamimoto, T. ; Kato, K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.414-421,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
5.

Conference Proceedings
Conference Proceedings
5. Evaluation of OASIS. VSB (SEMI P44) for practical use [6283-58]
Kuriyama, K. ; Suzuki, T. ; Narukawa, S. ; Mohri, H. ; Hoga, M. ; Hayashi, N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62832O-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
6.

Conference Proceedings
Conference Proceedings
6. The unified mask data format based on OASIS for VSB EB writers [5853-101]
Suzuki, T. ; Hirumi, J. ; Hojyo, Y. ; Kawase, Y. ; Sakamoto, S. ; Kuriyama, K. ; Narukawa, S. ; Hoga, M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.152-159,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853