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12 results

Conference Proceedings

1. Thin resist performance comparison for advanced e-beam reticle fabrication

Kobayashi,H. ; Higuchi,T. ; Asakawa,K. ; Yokoya,Y. ; Yamashiro,K.

Pub. info.:	Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan. pp.19-36, 1997. Bellingham, Washington. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3096

Conference Proceedings

2. CAR blanks feasibility study results

Yokoya,Y. ; Kobayashi,H. ; Higuchi,T. ; Asakawa,K. ; Kurikawa,A. ; Sakurai,T. ; Hashimoto,M. ; Ota,F.

Pub. info.:	16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany. pp.114-119, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3996

Conference Proceedings

3. Performance study on thin resist for advanced reticle fabrication

Kobayashi,H. ; Higuchi,T. ; Asakawa,K. ; Yokoya,Y.

Pub. info.:	16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany. pp.226-234, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3996

Conference Proceedings

4. CARs blanks feasibility study results for advanced EB reticle fabrication

Hashimoto,M. ; Kobayashi,H. ; Yokoya,Y.

Pub. info.:	20th Annual BACUS Symposium on Photomask Technology. pp.561-577, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4186

Conference Proceedings

5. Initial evaluation results of DNQ-novolak resist system for advanced e-beam reticle fabrication

Yokoya,Y. ; Kobayashi,H. ; Asakawa,K.

Pub. info.:	15th Annual BACUS Symposium on Photomask Technology and Management. pp.480-489, 1995. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2621

Conference Proceedings

6. Preliminary evaluation results of 895i and iPl7OO replacement resist for advanced laser reticle fabrication

Asakawa,K. ; Kobayashi,H. ; Higuchi,T. ; Yokoya,Y.

Pub. info.:	Photomask and X-Ray Mask Technology V. pp.297-306, 1998. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3412

Conference Proceedings

7. Novel techniques on photomask blanks enhancement for the laser reticle writer

Kobayashi,H. ; Asakawa,K. ; Yokoya,Y.

Pub. info.:	15th Annual BACUS Symposium on Photomask Technology and Management. pp.73-89, 1995. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2621

Conference Proceedings

8. CARs blanks feasibility study results for the advanced EB reticle fabrication (？)

Hashimoto,M. ; Ohta,F. ; Yokoya,Y. ; Kobayashi,H.

Pub. info.:	21st Annual BACUS Symposium on Photomask Technology. 4562 pp.682-693, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4562

Conference Proceedings

9. CAR blanks feasibility study results

Yokoya,Y. ; Kobayashi,H. ; Hashimoto,M. ; Ohta,F. ; Asakawa,K.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VII. pp.269-280, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4066

10.

Conference Proceedings

10. CARs blanks feasibility study results for advanced EB reticle fabrication: ？

Hashimoto,M. ; Ohta,F. ; Yokoya,Y. ; Kobayashi,H.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VIII. pp.312-323, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4409

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