1.

Conference Proceedings
Conference Proceedings
1. Thin resist performance comparison for advanced e-beam reticle fabrication
Kobayashi,H. ; Higuchi,T. ; Asakawa,K. ; Yokoya,Y. ; Yamashiro,K.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.19-36,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
2.

Conference Proceedings
Conference Proceedings
2. CAR blanks feasibility study results
Yokoya,Y. ; Kobayashi,H. ; Higuchi,T. ; Asakawa,K. ; Kurikawa,A. ; Sakurai,T. ; Hashimoto,M. ; Ota,F.
Pub. info.: 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany.  pp.114-119,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3996
3.

Conference Proceedings
Conference Proceedings
3. Performance study on thin resist for advanced reticle fabrication
Kobayashi,H. ; Higuchi,T. ; Asakawa,K. ; Yokoya,Y.
Pub. info.: 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany.  pp.226-234,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3996
4.

Conference Proceedings
Conference Proceedings
4. Laser resist screening for iP3500/3600 replacement for advanced reticle fabrication
Ohta,F. ; Kobayashi,H. ; Higuchi,T. ; Asakawa,K.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.553-560,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
5.

Conference Proceedings
Conference Proceedings
5. Preliminary evaluation results of 895i and iPl7OO replacement resist for advanced laser reticle fabrication
Asakawa,K. ; Kobayashi,H. ; Higuchi,T. ; Yokoya,Y.
Pub. info.: Photomask and X-Ray Mask Technology V.  pp.297-306,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3412
6.

Conference Proceedings
Conference Proceedings
6. Process optimization for thin resists for advanced e-beam reticle fabrication
Kobayashi,H. ; Higuchi,T. ; Yamashiro,K. ; Askawa,K.
Pub. info.: 16th Annual BACUS Symposium on Photomask Technology and Management.  pp.67-82,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2884
7.

Conference Proceedings
Conference Proceedings
7. PBS performance evaluation under a high-accelerating-voltage e-beam exposure
Kobayashi,H. ; Higuchi,T. ; Asakawa,K. ; Yokoya,Y.
Pub. info.: 17th Annual BACUS Symposium on Photomask Technology and Management.  pp.498-510,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3236
8.

Conference Proceedings
Conference Proceedings
8. Photomask blanks enhancement by optimizing resist baking and coating for advanced e-beam reticle fabrication
Higuchi,T. ; Kobayashi,H. ; Yamashiro,K. ; Asakawa,K. ; Yokoya,Y.
Pub. info.: Photomask and X-Ray Mask Technology III.  pp.78-95,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2793