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Conference Proceedings

1. Analysis of solvent effect to control the BARC coating uniformity

Jung, M.-H. ; Yoon, S. ; Chung, E.-S. ; Yoo, B.-S. ; Ya, J.Y. ; Winning, D. ; Kim, B.D. ; Lee, H. ; Kim, D.Y. ; Kim, Y.H. ; Kim, M. ; Chon, S.-M.

Pub. info.:	Advances in Resist Technology and Processing XXI. pp.703-710, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5376

Conference Proceedings

2. Influence of activation energy on LER in chemically amplified KrF photoresists

Kim, J.H. ; Lee, C.H. ; Park, S.B. ; Kim, W.M. ; Moon, S.S. ; Kim, K.-M. ; Lee, S.Y. ; Yoon, S. ; Kim, Y.H. ; Chon, S.-M.

Pub. info.:	Advances in Resist Technology and Processing XXI. pp.790-800, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5376

Conference Proceedings

3. Influence of resin properties to resist performance at ArF lithography

Yoon, S. ; Kim, M. ; Lee, H. ; Kim, D.Y. ; Kim, Y.H. ; Kim, B.D. ; Kim, J.H. ; Kim, K.-M. ; Lee, S.Y. ; Chon, S.-M.

Pub. info.:	Advances in Resist Technology and Processing XXI. pp.583-590, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5376

Conference Proceedings

4. Impact of BARC on SEM shrinkage of ArF resist

Lee, S.Y. ; Kim, M. ; Yoon, S. ; Kim, K.-M. ; Kim, J.H. ; Kim, H.-W. ; Woo, S.-G. ; Kim, Y.H. ; Chon, S.-M. ; Kishioka, T. ; Sone, Y. ; Nakajima, Y.

Pub. info.:	Advances in Resist Technology and Processing XXI. pp.575-582, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5376