Lee, C. H. ; Han, S. ; Park, K. S. ; Kang, H. Y. ; Oh, H. W. ; Lee, J. E. ; Kim, K. M. ; Kim, Y. H. ; Kim, T. S. ; Oh, H.-K.
Pub. info.:
Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA. pp.564-571, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Lee, C. H. ; Han, S. ; Park, K. S. ; Yoon, S. ; Kang, H. Y. ; Oh, H. W. ; Lee, J. E. ; Kim, Y. H. ; Kim, T. S. ; Oh, H.-K.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology XII. pp.749-756, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering