1.

Conference Proceedings
Conference Proceedings
1. Characterization and improvement of resist pattern collapse on ArF (193 nm) organic B.A.R.C.
Hwang, Y.-S. ; Jung, J.-C. ; Park, K.-D. ; Lee, S.-K. ; Kim, J.-S. ; Kong, K.-K. ; Shin, K.-S. ; Ding, S.-J. ; Xiang, Z. ; Neisser, M.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part Two  pp.1119-1125,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
2.

Conference Proceedings
Conference Proceedings
2. Contact hole resolution enhancement by post exposure amine treatment (CONPEAT) process
Koh, C.-W. ; Kim, J.-S. ; Choi, C.-I. ; Eom, T.-S. ; Kwon, W.-T. ; Jung, J.-C. ; Bok, C.-K. ; Shin, K.-S.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part Two  pp.793-798,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
3.

Conference Proceedings
Conference Proceedings
3. Contact hole patterning performance of ArF resist for 0.10μm technology node
Kim, J.-S. ; Jung, J.-C. ; Kong, K.-K. ; Lee, G.-S. ; Lee, S.-K. ; Hwang, Y.-S. ; Shin, K.-S.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.577-585,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
4.

Conference Proceedings
Conference Proceedings
4. 100-nm device fabrication using ArF resist
Lee, S.-K. ; Jung, J.-C. ; Hwang, Y.-S. ; Park, K.-D. ; Kim, J.-S. ; Kong, K.-K. ; Shin, K.-S.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.571-576,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
5.

Conference Proceedings
Conference Proceedings
5. Effects of alkali treatment on ArF resist process
Kim, J.-S. ; Jung, J.-C. ; Kong, K.-K. ; Kim, H.-R. ; Kim, H.-S.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.761-769,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039