1.

Conference Proceedings
Conference Proceedings
1. Double-exposure strategy using OPC and simulation and the performance on wafer with sub-0.10-μm design rule in ArF lithography
Oh, S.-Y. ; Kim, W.-H. ; Yune, H.-S. ; Kim, H.-B. ; Kim, S.-M. ; Ahn, C.-N. ; Shin, K.-S.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1537-1543,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
2.

Conference Proceedings
Conference Proceedings
2. Defect printability and specification of ArF mask in repeating feature
Kim, W.-H. ; Ma, W.-K. ; Kim, H.-B.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1357-1365,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691