1.

Conference Proceedings
Conference Proceedings
1. Investigation of several materials as buffer layer candidates of EUVL mask
Kim, D. ; Tanaka, Y. ; Yamanashi, H. ; Nishiyama, I.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.841-848,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
2.

Conference Proceedings
Conference Proceedings
2. EUV absorbance and dry-etching characteristics of TaGeN films for EUVL mask absorber
Tanaka, Y. ; Kim, D. ; Yamanashi, H. ; Nishiyama, I.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.281-288,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374