1.

Conference Proceedings
Conference Proceedings
1. Investigation of the effect of resist components and process condition on photochemical efficiency of ArF photoresist
Kim, J.-W. ; Son, E.-K. ; Lee, S.-H. ; Kim, D. ; Kim, J. ; Lee, G. ; Jung, J.C. ; Bok, C.K. ; Moon, S.C. ; Shin, K.S.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.599-607,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
2.

Conference Proceedings
Conference Proceedings
2. Effects of quencher ability on profile in chemically amplified resist system
Kim, D. ; Kim, H.-J. ; Cho, S.-H. ; Lee, D.-H. ; Im, K.-H. ; Yoo, M.-J. ; Lee, S.-H. ; Kim, J. ; Kim, J.-S. ; Kim, H.-S.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.1086-1097,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039