1.

Conference Proceedings
Conference Proceedings
1. Method of expanding process window for the double exposure technique with alt-PSMs
Kikuchi,K. ; Ohnuma,H. ; Kawahira,H.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.121-131,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. Fabrication process of Cr-based attenuated phase-shift masks for KrF excimer laser Lithography
Kagami,I. ; Ishikawa,K. ; Kakuta,D. ; Kawahira,H.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.953-963,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
3.

Conference Proceedings
Conference Proceedings
3. PMJ '99 panel discussion review:OPC mask technology for KrF Lithography
Kawahira,H. ; Hayashi,N. ; Hamada,H.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.318-327,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
4.

Conference Proceedings
Conference Proceedings
4. Photomask fabrication feasibility for next-generation reticle format
Katsumata,M. ; Kawahira,H. ; Nozawa,S.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.198-205,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
5.

Conference Proceedings
Conference Proceedings
5. Fast chip-level OPC system on mask database
Ohnuma,H. ; Tsudaka,K. ; Kawahira,H.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.145-153,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
6.

Conference Proceedings
Conference Proceedings
6. Effective data compaction algorithm for vector scan EB writing system
Ueki,S. ; Ashida,I. ; Kawahira,H.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.589-600,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
7.

Conference Proceedings
Conference Proceedings
7. Fast EB-PEC system for 0.25-ｦﾌm device reticle fabrication using a variable shaped beam machine
Tomita,M. ; Ohnuma,H. ; Koyama,M. ; Kawahira,H.
Pub. info.: 15th Annual BACUS Symposium on Photomask Technology and Management.  pp.546-557,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2621
8.

Conference Proceedings
Conference Proceedings
8. Attenuated phase-shifting mask specification with modified beam illumination
Kagami,I. ; Sugawara,M. ; Kawahira,H. ; Tsudaka,K. ; Ishikawa,K. ; Nozawa,S.
Pub. info.: 15th Annual BACUS Symposium on Photomask Technology and Management.  pp.445-456,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2621
9.

Conference Proceedings
Conference Proceedings
9. Defect printability study of attenuated phase-shifting masks for specifying inspection sensitivity
Sugawara,M. ; Ishikawa,K. ; Kawahira,H. ; Kagami,I. ; Nozawa,S.
Pub. info.: 15th Annual BACUS Symposium on Photomask Technology and Management.  pp.457-472,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2621
10.

Conference Proceedings
Conference Proceedings
10. Chemically amplified resist process for 0.25-ｦﾌm-generation photomasks
Katsumata,M. ; Kawahira,H. ; Sugawara,M. ; Nozawa,S.
Pub. info.: 16th Annual BACUS Symposium on Photomask Technology and Management.  pp.83-91,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2884
11.

Conference Proceedings
Conference Proceedings
11. Influence of process latitude on exposure characteristics
Sugawara,M. ; Kawahira,H. ; Nozawa,S.
Pub. info.: Optical Microlithography IX.  Part2  pp.583-597,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726
12.

Conference Proceedings
Conference Proceedings
12. Development of fast linewidth correction system
Takenouchi,R. ; Ashida,I. ; Kawahira,H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.688-696,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
13.

Conference Proceedings
Conference Proceedings
13. Magneic neutral loop discharge etching for 130-nm generation photomask fabrication
Katsumata,M. ; Kawahira,H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.210-217,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
14.

Conference Proceedings
Conference Proceedings
14. High-performance devices in the new century: optical lithography and mask strategy for 0.13-μm SoC (Photomask Japan 2000 panel discussion review)
Kawahira,H. ; Nagano,V.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.384-394,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
15.

Conference Proceedings
Conference Proceedings
15. Automatic alternative phase-shift mask CAD layout tool for gate shrinkage of ebedded DRAM in logic below 0.18 ｦﾌm
Ohnuma,H. ; Kawahira,H.
Pub. info.: Photomask and X-Ray Mask Technology V.  pp.206-213,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3412
16.

Conference Proceedings
Conference Proceedings
16. New mask data verification method after optical proximity effect correction
Ogawa,K. ; Ashida,I. ; Kawahira,H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.186-193,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
17.

Conference Proceedings
Conference Proceedings
17. Focused ion beam repair for quartz bump defect of alternating phase-shift masks
Kagami,I. ; Kakuta,D. ; Komizo,T. ; Kawahira,H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.563-573,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
18.

Conference Proceedings
Conference Proceedings
18. Optimization of fabrication process for dual-trench-type alternating PSM
Komizo,T. ; Kagami,I. ; Kakuta,D. ; Kawahira,H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.125-131,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
19.

Conference Proceedings
Conference Proceedings
19. New optimization method of exposure with alternative phase-shifting masks
Kikuchi,K. ; Ohnuma,H. ; Kawahira,H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.41-51,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
20.

Conference Proceedings
Conference Proceedings
20. New method for reducing across chip poly-CD variation with statistical OPC/gauge capability analysis
Ohnuma,H. ; Kikuchi,K. ; Kawahira,H.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.362-367,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
21.

Conference Proceedings
Conference Proceedings
21. Issues on mask technologies:0.18-ｦﾌm and beyond
Hayashi,N. ; Kawahira,H. ; Hamada,H.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.338-339,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546
22.

Conference Proceedings
Conference Proceedings
22. Chemically amplified resist process for 0.25-ｦﾌm generation photomasks
Katsumata,M. ; Kawahira,H. ; Sugawara,M. ; Nozawa,S.
Pub. info.: Photomask and X-Ray Mask Technology III.  pp.96-104,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2793
23.

Conference Proceedings
Conference Proceedings
23. Manufacturing feasibility of OPC masks for 0.25-ｦﾌm rule devices
Kawahira,H. ; Katsumata,M. ; Tsudaka,K. ; Ogura,A. ; Tomita,M. ; Nozawa,S.
Pub. info.: Photomask and X-Ray Mask Technology III.  pp.22-33,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2793
24.

Conference Proceedings
Conference Proceedings
24. Review of defect roundtable at Photomask Japan '96
Kawahira,H. ; Wiley,J.N.
Pub. info.: 16th Annual BACUS Symposium on Photomask Technology and Management.  pp.532-547,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2884