Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.121-131, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan. pp.145-153, 1997. Bellingham, Washington. SPIE-The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
15th Annual BACUS Symposium on Photomask Technology and Management. pp.546-557, 1995. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Photomask and Next-Generation Lithography Mask Technology VIII. pp.41-51, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering