1.

Conference Proceedings
Conference Proceedings
1. Fabrication process of Cr-based attenuated phase-shift masks for KrF excimer laser Lithography
Kagami,I. ; Ishikawa,K. ; Kakuta,D. ; Kawahira,H.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.953-963,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
2.

Conference Proceedings
Conference Proceedings
2. Attenuated phase-shifting mask specification with modified beam illumination
Kagami,I. ; Sugawara,M. ; Kawahira,H. ; Tsudaka,K. ; Ishikawa,K. ; Nozawa,S.
Pub. info.: 15th Annual BACUS Symposium on Photomask Technology and Management.  pp.445-456,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2621
3.

Conference Proceedings
Conference Proceedings
3. Defect printability study of attenuated phase-shifting masks for specifying inspection sensitivity
Sugawara,M. ; Ishikawa,K. ; Kawahira,H. ; Kagami,I. ; Nozawa,S.
Pub. info.: 15th Annual BACUS Symposium on Photomask Technology and Management.  pp.457-472,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2621
4.

Conference Proceedings
Conference Proceedings
4. Focused ion beam repair for quartz bump defect of alternating phase-shift masks
Kagami,I. ; Kakuta,D. ; Komizo,T. ; Kawahira,H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.563-573,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
5.

Conference Proceedings
Conference Proceedings
5. Optimization of fabrication process for dual-trench-type alternating PSM
Komizo,T. ; Kagami,I. ; Kakuta,D. ; Kawahira,H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.125-131,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409