1.

Conference Proceedings
Conference Proceedings
1. Investigation of lithographic performance for 120-nm and sub-120-nm gate applications of advanced ArF resists based on VEMA co-polymers
Kavanagh, R.J. ; Orsula, G.W. ; Hellion, M. ; Barclay, G.G. ; Caporale, S. ; Pugliano, N. ; Thackeray, J.W. ; Mortini, B.P.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.141-149,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
2.

Conference Proceedings
Conference Proceedings
2. Mechanistic understanding of post-etch roughness in 193-nm photoresists
Bae, Y.C. ; Barclay, G.G. ; Bolton, P.J. ; Kavanagh, R.J. ; Bu, L. ; Kobayashi, T. ; Adams, T. ; Pugliano, N. ; Thackeray, J.W.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.665-671,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039