1.

Conference Proceedings
Conference Proceedings
1. Investigation of lithographic performance for 120-nm and sub-120-nm gate applications of advanced ArF resists based on VEMA co-polymers
Kavanagh, R.J. ; Orsula, G.W. ; Hellion, M. ; Barclay, G.G. ; Caporale, S. ; Pugliano, N. ; Thackeray, J.W. ; Mortini, B.P.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.141-149,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
2.

Conference Proceedings
Conference Proceedings
2. Influence of backbone chemistry on the post-exposure bake temperature sensitivity of 193-nm photoresists
Bae, Y.C. ; Ogawa, T. ; Kavanagh, R.J. ; Kobayashi, T. ; Lindsay, T. ; Tanaka, T. ; Xu, C.B. ; Orsula, G. ; DeSisto, J. ; Hellion, M.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.1123-1130,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376