1.

Conference Proceedings
Conference Proceedings
1. Influence of backbone chemistry on the post-exposure bake temperature sensitivity of 193-nm photoresists
Bae, Y.C. ; Ogawa, T. ; Kavanagh, R.J. ; Kobayashi, T. ; Lindsay, T. ; Tanaka, T. ; Xu, C.B. ; Orsula, G. ; DeSisto, J. ; Hellion, M.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.1123-1130,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
2.

Conference Proceedings
Conference Proceedings
2. Mechanistic understanding of post-etch roughness in 193-nm photoresists
Bae, Y.C. ; Barclay, G.G. ; Bolton, P.J. ; Kavanagh, R.J. ; Bu, L. ; Kobayashi, T. ; Adams, T. ; Pugliano, N. ; Thackeray, J.W.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.665-671,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
3.

Conference Proceedings
Conference Proceedings
3. Methods to achieve sub-100-nm contact hole lithography
Lindsay, T.K. ; Kavanagh, R.J. ; Pohlers, G. ; Kanno, T. ; Bae, Y.C. ; Barclay, G.G. ; Kanagasabapathy, S. ; Mattia, J.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.705-712,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039