1.

Conference Proceedings
Conference Proceedings
1. Process, design, and optical proximity correction requirements for the 65-nm device generation
Lucas, K. ; Montgomery, P. ; Litt, L.C. ; Conley, W. ; Postnikov, S.V. ; Wu, W. ; Yuan, C.-M. ; Olivares, M. ; Strozewski, K. ; Carter, R.L. ; Vasek, J. ; Smith, D. ; Fanucchi, E.L. ; Wiaux, V. ; Vandenberghe, G. ; Toublan, O. ; Verhappen, A. ; Kuijten, J.P. ; van Wingerden, J. ; Kasprowicz, B.S. ; Tracy, J.W. ; Progler, C.J. ; Shiro, E. ; Topouzov, I. ; Wimmer, K. ; Roman, B.J.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.353-364,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
2.

Conference Proceedings
Conference Proceedings
2. Process, design and optical proximity correction requirements for the 65nm device generation
Lucas, K. ; Montgomery, P. ; Litt, L.C. ; Conley, W. ; Postnikov, S.V. ; Wu, W. ; Yuan, C.-M. ; Olivares, M. ; Strozewski, K. ; Carter, R.L. ; Vasek, J. ; Smith, D. ; Fanucchi, E.L. ; Wiaux, V. ; Vandenberghe, G. ; Toublan, O. ; Verhappen, A. ; Kuijten, J.P. ; Wingerden, J. ; Kasprowicz, B.S. ; Tracy, J.W. ; Progler, C.J. ; Shiro, E. ; Topouzov, I. ; Wimmer, K. ; Roman, B.J.
Pub. info.: Optical Microlithography XVI.  Part One  pp.408-419,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
3.

Conference Proceedings
Conference Proceedings
3. Defect printability in CPL mask technology
Kuijten, J.-P. ; Verhappen, A. ; Pijnenburg, W. ; Conley, W. ; Litt, L.C. ; Wu, W. ; Montgomery, P. ; Roman, B.J. ; Kasprowicz, B.S. ; Progler, C.J. ; Socha, R.J. ; Van Den Broeke, D.J. ; Schaefer, E. ; Cook, P.
Pub. info.: Optical Microlithography XVII.  pp.1032-1039,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
4.

Conference Proceedings
Conference Proceedings
4. The impact of MEEF through pitch for 120-nm contact holes
Litt, L.C. ; Wu, W. ; Conley, W. ; Lucas, K.D. ; Roman, B.J. ; Montgomery, P. ; Kasprowicz, B.S. ; Progler, C.J. ; Socha, R.J. ; Verhappen, A. ; Wampler, K.E. ; Schaefer, E. ; Cook, P. ; Kuijten, J.-P. ; Pijnenburg, W.
Pub. info.: Optical Microlithography XVII.  pp.1305-1314,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377