1.

Conference Proceedings
Conference Proceedings
1. Photoacid generation in chemically amplified resists: elucidation of structural effects of photoacid generators using new acid-sensitive dyes for monitoring acid generation
Cameron,J.F. ; Mori,J.M. ; Zydowsky,T.M. ; Kang,D. ; Sinta,R.F. ; King,M. ; Scaiano,J.C. ; Pohlers,G. ; Virdee,S. ; Connolly,T.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.680-691,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
2.

Conference Proceedings
Conference Proceedings
2. Development of DUV resist formulations with excellent performance on metal substrates
Rajaratnam,M.M. ; Cameron,J.F. ; Georger,J.H. ; Kang,D. ; Prokopowicz,G. ; Sinta,R.F. ; Thackeray,J.W.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.692-705,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
3.

Conference Proceedings
Conference Proceedings
3. Design and performance of photoresist materials for ArF lithography
Kim,H.-W. ; Jung,D.-W. ; Lee,S. ; Choi,S.-J. ; Woo,S.-G. ; Kavanagh,R.J. ; Barclay,G.G. ; Blacksmith,R.F. ; Kang,D. ; Pohlers,G. ; Cameron,J.F. ; Mattia,J. ; Caporale,S. ; Penniman,T. ; Joesten,L.A. ; Thackeray,J.W.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.776-783,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345