1.

Conference Proceedings
Conference Proceedings
1. Robust control of lithographic process in semiconductor manufacturing
Kang, W. ; Mao, J.
Pub. info.: Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA.  pp.29-36,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5755
2.

Conference Proceedings
Conference Proceedings
2. QUANTUM HALL EFFECT AND RAPID OSCILLATIONS IN (TMTSF)2PF6 UNDER PRESSURE
Hennahs, S. T. ; Brooks, J. S. ; Kang, W. ; Chaikin, P. M. ; Chiang, L. Y. ; Upasani, R.
Pub. info.: Advanced organic solid state materials : symposium held November 27-December 2, 1989, Boston, Massachusetts, U.S.A..  pp.251-256,  1990.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 173
3.

Conference Proceedings
Conference Proceedings
3. Benchmark comparison of multiple process control strategies for lithographic CD control [6152-14]
Kang, W. ; Mao, J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61520E-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152
4.

Conference Proceedings
Conference Proceedings
4. Application of photosensitive BARC and KrF resist on implant layers
Owe-Yang, D.C. ; Ho, B.- ; Miyazaki, S. ; Katayama, T. ; Susukida, K. ; Kang, W. ; Chang, Y.-C.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.452-460,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
5.

Conference Proceedings
Conference Proceedings
5. Acid diffusion characteristics of RELACS coating for 193-nm lithography
Hong, S. ; Nishibe, T. ; Okayasu, T. ; Takahashi, K. ; Takano, Y. ; Kang, W. ; Tanaka, H.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.285-293,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376