1.

Conference Proceedings
Conference Proceedings
1. Robust control of lithographic process in semiconductor manufacturing
Kang, W. ; Mao, J.
Pub. info.: Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA.  pp.29-36,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5755
2.

Conference Proceedings
Conference Proceedings
2. Benchmark comparison of multiple process control strategies for lithographic CD control [6152-14]
Kang, W. ; Mao, J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61520E-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152