1.

Conference Proceedings
Conference Proceedings
1. Dissolution fundamentals of 193-nm methacrylate-based photoresists [6153-37]
Rao, A. ; Kang, S. ; Vogt, B. D. ; Prabhu, V. M. ; Lin, E.K. ; Wu, W.L. ; Turnquest, K. ; Hinsberg,W.D
Pub. info.: Advances in Resist Technology and Processing XXIII.  pp.615310-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6153
2.

Conference Proceedings
Conference Proceedings
2. The deprotection reaction front profile in model 193 nm methacrylate-based chemically amplified photoresists [6153-43]
Vogt, B. D. ; Kang, S. ; Prabhu, V. M. ; Rao, A. ; Lin, E. K. ; Satija, S. K. ; Turnquest, K. ; Wu, W.
Pub. info.: Advances in Resist Technology and Processing XXIII.  pp.615316-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6153