1.

Conference Proceedings
Conference Proceedings
1. STRAIN RELIEF AND DEFECT FORMATION IN HIGH DOSE OXYGEN IMPLANTED SILICON
Venables, D. ; Jones, K. S. ; Namavar, F. ; Manke, J. M.
Pub. info.: Phase formation and modification by beam-solid interactions : symposium held December 2-6, 1991, Boston, Massachusetts, U.S.A..  pp.103-108,  1992.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 235
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Conference Proceedings
Conference Proceedings
2. THE EFFECT OF IMPLANT SPECIES ON THE STABILITY OF ION IMPLANTATION DAMAGE
Jones, K. S. ; Prussin, S. ; Venables, D.
Pub. info.: Fundamentals of beam-solid interactions and transient thermal processing : symposium held November 30-December 3, 1987, Boston, Massachusetts, U.S.A..  pp.277-282,  1988.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 100
3.

Conference Proceedings
Conference Proceedings
3. Effect of Energy and Dose on Transient-Enhanced Diffusion and Defect Microstructure in Low-Energy-High-Dose As+-Implanted Si
Krishnamoorthy, V. ; Venables, D. ; Moeller, K. ; Jones, K. S. ; Freer, B.
Pub. info.: Microstructure evolution during irradiation : symposium held December 2-5, 1996, Boston, Massachusetts, U.S.A..  pp.29-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 439
4.

Conference Proceedings
Conference Proceedings
4. The Role of Vacancies and Interstitials in Transient-Enhanced Diffusion of Arsenic Implanted Into Silicon
Venables, D. ; Krishnamoorthy, V. ; Gossmann, H-J. ; Lilak, A. ; Jones, K. S. ; Jacobson, D. C.
Pub. info.: Defects and diffusion in silicon processing : symposium held April 1-4, 1997, San Francisco, California, U.S.A..  pp.315-,  1997.  Pittsburg, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 469
5.

Conference Proceedings
Conference Proceedings
5. Effect of End-of-Range Defects, Arsenic Clustering, and Precipitation on Transient-Enhanced Diffusion in As+- Implanted Si
Krishnamoorthy, V. ; Venables, D. ; Moeller, K. ; Jones, K. S. ; Jackson, J.
Pub. info.: Defects and diffusion in silicon processing : symposium held April 1-4, 1997, San Francisco, California, U.S.A..  pp.401-,  1997.  Pittsburg, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 469
6.

Conference Proceedings
Conference Proceedings
6. Effect of Energy and Dose on Transient-Enhanced Diffusion and Defect Microstructure in Low-Energy High-Dose As+ Implanted Si
Krishnamoorthy, V. ; Venables, D. ; Moeller, K. ; Jones, K. S. ; Freer, B.
Pub. info.: Materials modification and synthesis by ion beam processing : symposium held December 2-5, 1996, Boston, Massachusetts, U.S.A..  pp.21-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 438